Equipment

The target laboratory has different  locations at its disposal: A conventional lab with a temperature-stabilized and moisture-stabilized room, a room for chemical and mechanical processing and one for analytics. Additionally, and the Radioaktive Lab, a laboratory in a surveilled area, where weak radioactive materials can be handled. Targets are produced by evaporation, by magnetron sputtering, by mechanical processing, and by cold rolling. Especially sensitive respectively weak radioactive materials like depleted Uranium or Thorium can also be cold rolled and packed in a glove box in the Radioactive Lab. For storage and transport there are desiccators and sealable ampoules available as well as a second glove box.

Coating plants
Thermal evaporation, electron beam gun evaporation, magnetron sputtering
On the picture you see a Edwards Auto 306 coating plant with a glass recipient. It is equipped with thermal evaporation and an electron beam gun.
Edwards Auto 306 with glass recipient: Therm. evaporation and electron beam gun evaporation
In the picture you see the electron beam gun under a substrate holder and a quartz lamp for substrate heating
Detail: Electron beam gun with substrate holder and quartzheater
On the picture you see an Edwards Auto 306 evaporation plant with a evaporation wheel. The plant is equipped with thermal evaporation.
Edwards Auto 306 with evaporation wheel for SHIP experiment: thermal evaporation
On this picture you see a detailed view. A tantalum crucible is located directly below the evaporation wheel. In front you see a quartz crystal sensor for measuring the evaporation rate.
Detail: Tantalum crucible below the evaporation wheel with quartz sensor in front
On the picture you see an Edwards Auto 500 coating plant equipped with DC and RF magnetron sputtering sources.
Edwards Auto 500: DC u. RF Magnetronsputtern
On this picture you see a 1 inch magnetron source
Detail: 1"-Magnetron sputtering source
On this picture you see an Edwards Auto 500 coating plant for coating with carbon by resistive heating of a carbon rod.
Edwards Auto 500 for coating with carbon with resistive heating
On this picture you see a detail of the recipient. A carbon rod is clamped to the copper electrodes.
Detail of the recipient with mounted graphite rod
On the picture you see a Creamet coating plant. It is equipped with a ceramic double evaporator, magentron sputtering and thermal evaporation
Creamet coating plant: ceramic double evaporator, magnetron sputtering, thermal evaporation
On this picture you see a detailed view of the magnetron source with a substrate holder above
Detail: Magnetron source with substrate holder
On this picture you see a thermal evaporator consisting of a metal boat clamped to the electrodes
Thermal evaporator with clamped boar
On this picture you see a double ceramic heater
Ceramic double heater

The target laboratory has the following possibilities for the production, processing and measuring of targets:

Determination of thickness
Auxiliaries:
Mechanical processing

Cold Rolling, lapping, polishing, grinding, cutting:

Targetlabor Ausstattung 08

If you have any further questions or remarks, please send an email to B.Kindler.


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